This lecture focuses on special and complex problems encountered during the fabrication of integrated devices and circuits. It builds on the lectures Fundamentals of Semiconductor Elements and Semiconductor Technology, emphasizing the interplay among the different process steps in the manufacturing of integrated circuits.
![[Translate to English:] TEM Querschnittsaufnahme eines integrierten Schaltkreises inklusive Back-End-Of-Line](https://www.mbe.uni-hannover.de/fileadmin/_processed_/e/0/csm_TIB_6a00c642b7.jpg)
![[Translate to English:] TEM Querschnittsaufnahme eines integrierten Schaltkreises inklusive Back-End-Of-Line](https://www.mbe.uni-hannover.de/fileadmin/_processed_/e/0/csm_TIB_14af70d8d1.jpg)
![[Translate to English:] TEM Querschnittsaufnahme eines integrierten Schaltkreises inklusive Back-End-Of-Line](https://www.mbe.uni-hannover.de/fileadmin/_processed_/e/0/csm_TIB_0d2b69f5eb.jpg)
Content
- Trends in electronics
- Manufacturing / Yield / Statistical parameter control / Technology transfer
- Isolation techniques
- Contacts and interconnects (back-end-of-line)
- A CMOS process in detail
- High-K dielectrics
- Basics of epitaxy/strained layers
- Heteroepitaxial devices
- Potential future advancements in electronics
Dates and Materials
The exam will take place as an oral examination on 10.02.25 and 10.03.2025 from 13:00 in the MBE. The corresponding time slots can be found in the StudIP course.
In order to take the exam, you must register for it online at the Examinations Office. Please note the registration period, which is binding for your course of study. Subsequent registrations are not possible.
Contact Us
Lecture
chief engineer
30167 Hannover