Vorträge

Konferenzbeitrag

• O. Kerker, T. F. Wietler, K. R. Hofmann (2006): Characterization of HfO2 deposited by reactive sputtering as gate dielectric for epitaxial Ge-MOSFETs on Si wafers,  E-MRS 2006 Spring Meeting, Nice, France, 29.05.-02.06.2006
• O. Kerker, J. Zachariae, F. Mirza, R. Ferretti, K. R. Hofmann (2005): Investigation of Electrical and Optical Properties of BaxSr1-xO Gate Oxide MIS Structures,  DPG-Frühjahrstagung, Berlin, Germany, 04.-09.03.2005